Ultra-high vacuum deposition techniques
- We have a variety of techniques that can be used for high-precision deposition of materials onto substrates, which allow us to functionalise surfaces
- The simplest method is via sublimation onto the substrate surface of interest
- Nanoscale control of the thickness of the absorbed layers is achieved by controlling the flux and deposition time.
- Electrospray deposition allows for well-defined surface layers of macromolecules to be grown
- In this process a solution is emitted from a capillary in a jet of microdroplets, as the solution enters a vacuum the solvent evaporates leaving the macromolecules which are directed at the substrate in a molecular beam.
Spin coating allows the deposition of films on flat or patterned surfaces. This technique has been used in the manufacturing of integrated circuits, optical mirrors as well as for the production of antimicrobial surfaces.
- The advantages of spin coating are the simplicity and relative ease with which a process can be set up coupled with the thin and uniform coating that can be achieved
- Due to the ability to have high spin speeds the high airflow leads to fast drying times which in turn results in high consistency at both macroscopic and nano length scales.