Photo of Dr Kate Black

Dr Kate Black

Lecturer in Additive Manufacturing Mechanical, Materials & Aerospace Eng

    Publications

    2016

    Silver Ink Formulations for Sinter-free Printing of Conductive Films (Journal article)

    Black, K., Singh, J., Mehta, D., Sung, S., Sutcliffe, C. J., & Chalker, P. R. (2016). Silver Ink Formulations for Sinter-free Printing of Conductive Films. SCIENTIFIC REPORTS, 6. doi:10.1038/srep20814

    DOI: 10.1038/srep20814

    2013

    NON-NEWTONIAN LEIDENFROST DROPS (Journal article)

    Black, K., & Bertola, V. (2013). NON-NEWTONIAN LEIDENFROST DROPS. ATOMIZATION AND SPRAYS, 23(3), 233-247. doi:10.1615/AtomizSpr.2013007461

    DOI: 10.1615/AtomizSpr.2013007461

    2011

    Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO 2 (Journal article)

    Aspinall, H. C., Bacsa, J., Jones, A. C., Wrench, J. S., Black, K., Chalker, P. R., . . . Odedra, R. (2011). Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO 2. Inorganic Chemistry, 50(22), 11644-11652. doi:10.1021/ic201593s

    DOI: 10.1021/ic201593s

    Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct (Journal article)

    Kanjolia, R., Jones, A. C., Ashraf, S., Bacsa, J., Black, K., Chalker, P. R., . . . Heys, P. N. (2011). Dimethylzinc adduct chemistry revisited: MOCVD of vertically aligned ZnO nanowires using the dimethylzinc 1,4-dioxane adduct. JOURNAL OF CRYSTAL GROWTH, 315(1), 292-296. doi:10.1016/j.jcrysgro.2010.09.016

    DOI: 10.1016/j.jcrysgro.2010.09.016

    Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition (Journal article)

    King, P. J., Werner, M., Chalker, P. R., Jones, A. C., Aspinall, H. C., Basca, J., . . . Heys, P. N. (2011). Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition. Thin Solid Films, 50(22), 11644-11652.

    SrHfO3 Films Grown on Si(100) by Plasma-Assisted Atomic Layer Deposition (Journal article)

    Black, K., Werner, M., Rowlands-Jones, R., Chalker, P. R., & Rosseinsky, M. J. (2011). SrHfO3 Films Grown on Si(100) by Plasma-Assisted Atomic Layer Deposition. CHEMISTRY OF MATERIALS, 23(10), 2518-2520. doi:10.1021/cm200315u

    DOI: 10.1021/cm200315u

    2010

    A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc (Journal article)

    Black, K., Chalker, P. R., Jones, A. C., King, P. J., Roberts, J. L., & Heys, P. N. (2010). A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc. CHEMICAL VAPOR DEPOSITION, 16(1-3), 106-111. doi:10.1002/cvde.200906831

    DOI: 10.1002/cvde.200906831

    In situ preparation of network forming gold nanoparticles in agarose hydrogels (Journal article)

    Faoucher, E., Nativo, P., Black, K., Claridge, J. B., Gass, M., Romani, S., . . . Brust, M. (2009). In situ preparation of network forming gold nanoparticles in agarose hydrogels. CHEMICAL COMMUNICATIONS, (43), 6661-6663. doi:10.1039/b915787e

    DOI: 10.1039/b915787e

    Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2 (Journal article)

    Black, K., Jones, A. C., Bacsa, J., Chalker, P. R., Marshall, P. A., Davies, H. O., . . . Critchlow, G. W. (2010). Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2. CHEMICAL VAPOR DEPOSITION, 16(1-3), 93-99. doi:10.1002/cvde.200906818

    DOI: 10.1002/cvde.200906818

    The optical properties of vertically aligned ZnO nanowires deposited using a dimethylzinc adduct (Journal article)

    Black, K., Jones, A. C., Alexandrou, I., Heys, P. N., & Chalker, P. R. (2010). The optical properties of vertically aligned ZnO nanowires deposited using a dimethylzinc adduct. NANOTECHNOLOGY, 21(4). doi:10.1088/0957-4484/21/4/045701

    DOI: 10.1088/0957-4484/21/4/045701

    2009

    Deposition of TiO2 Films by Liquid Injection ALD Using New Titanium 2,5-dimethylpyrrolyl Complexes (Journal article)

    Davies, H. O., Jones, A. C., Black, K., Bacsa, J., Chalker, P. R., Marshall, P. A., . . . O'Brien, P. (2009). Deposition of TiO2 Films by Liquid Injection ALD Using New Titanium 2,5-dimethylpyrrolyl Complexes. EUROCVD 17 / CVD 17, 25(8), 813-819. doi:10.1149/1.3207671

    DOI: 10.1149/1.3207671

    GaN, AlGaN, HfO2 based radial heterostructure nanowires (Journal article)

    Lari, L., Walther, T., Black, K., Murray, R. T., Bullough, T. J., Chalker, P. R., . . . Riechert, H. (2010). GaN, AlGaN, HfO2 based radial heterostructure nanowires. 16TH INTERNATIONAL CONFERENCE ON MICROSCOPY OF SEMICONDUCTING MATERIALS, 209. doi:10.1088/1742-6596/209/1/012011

    DOI: 10.1088/1742-6596/209/1/012011

    MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor (Journal article)

    Wrench, J. S., Black, K., Aspinall, H. C., Jones, A. C., Bacsa, J., Chalker, P. R., . . . Heys, P. N. (2009). MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor. Chemical Vapour Deposition, 15, 1-3.

    Permittivity enhancement and dielectric relaxation of doped hafnium and zirconium oxide (Journal article)

    Werner, M., Zhao, C. Z., Taylor, S., Chalker, P. R., Black, K., & Gaskell, J. (2009). Permittivity enhancement and dielectric relaxation of doped hafnium and zirconium oxide. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA, 625-627. doi:10.1109/IPFA.2009.5232568

    DOI: 10.1109/IPFA.2009.5232568

    γ-Al2O3 nanoparticle production by arc-discharge in water: In situ discharge characterization and nanoparticle investigation (Journal article)

    Delaportas, D., Svarnas, P., Alexandrou, I., Siokou, A., Black, K., & Bradley, J. W. (2009). γ-Al2O3 nanoparticle production by arc-discharge in water: In situ discharge characterization and nanoparticle investigation. Journal of Physics D: Applied Physics, 42(24).

    2008

    Deposition of Pr- and Nd-aluminate by liquid injection MOCVD and ALD using single-source heterometallic alkoxide precursors (Journal article)

    Gaskell, J. M., Przybylak, S., Jones, A. C., Aspinall, H. C., Chalker, P. R., Black, K., . . . Taylor, S. (2008). Deposition of Pr- and Nd-aluminate by liquid injection MOCVD and ALD using single-source heterometallic alkoxide precursors. Chemistry of Materials, 19(19), 4796-4903.

    Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors (Journal article)

    Black, K., Aspinall, H. C., Jones, A. C., Przybylak, K., Bacsa, J., Chalker, P. R., . . . Heys, P. N. (2008). Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors. Journal of Materials Chemistry, 18(38), 4561-4571.

    MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si (Journal article)

    Black, K., Jones, A. C., Chalker, P. R., Gaskell, J. M., Murray, R. T., Joyce, T. B., & Rushworth, S. A. (2008). MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si. JOURNAL OF CRYSTAL GROWTH, 310(5), 1010-1014. doi:10.1016/j.jcrysgro.2007.11.131

    DOI: 10.1016/j.jcrysgro.2007.11.131

    Permittivity enhancement of hafnium dioxide high- κ films by cerium doping (Journal article)

    Chalker, P. R., Werner, M., Romani, S., Potter, R. J., Black, K., Aspinall, H. C., . . . Heys, P. N. (2008). Permittivity enhancement of hafnium dioxide high- κ films by cerium doping. Applied Physics Letters, 93(18).

    2007

    Growth of HfO2 by liquid injection MOCVD and ALD using new hafnium-cyclopentadienyl precursors (Journal article)

    O'Kane, R., Gaskell, J., Jones, A. C., Chalker, P. R., Black, K., Werner, M., . . . Odedra, R. (2007). Growth of HfO2 by liquid injection MOCVD and ALD using new hafnium-cyclopentadienyl precursors. CHEMICAL VAPOR DEPOSITION, 13(11), 609-617. doi:10.1002/cvde.200706589

    DOI: 10.1002/cvde.200706589

    Liquid injection MOCVD and ALD of ZrO2 using Zr-cyclopentadienyl precursors (Journal article)

    Gaskell, J. M., Jones, A. C., Black, K., Chalker, P. R., Leese, T., Kingsley, A., . . . Heys, P. N. (2007). Liquid injection MOCVD and ALD of ZrO2 using Zr-cyclopentadienyl precursors. Surface and Coatings Technology, 201(22-23), 9095-9098.

    2006

    Liquid injection ALD and MOCVD of lanthanum aluminate using a bimetallic alkoxide precursor (Journal article)

    Gaskell, J. M., Jones, A. C., Aspinall, H. C., Przybylak, S., Chalker, P. R., Black, K., . . . Critchlow, G. W. (2006). Liquid injection ALD and MOCVD of lanthanum aluminate using a bimetallic alkoxide precursor. Journal of Materials Chemistry, 16(39), 3854-3860.
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